Growth and Study of Cubic Silicon Carbide (3C-Sic Thin Filma by Hot Wire Chemical Vapour Deposition Technique

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dc.contributor.authorJha, Himanshu Shekhar
dc.date.accessioned2015-09-28T09:58:48Z
dc.date.accessioned2023-10-26T09:57:30Z
dc.date.available2015-09-28T09:58:48Z
dc.date.available2023-10-26T09:57:30Z
dc.date.issued2015
dc.descriptionSupervisor: Pratima Agarwalen_US
dc.description.abstractAbstract not availableen_US
dc.identifier.otherROLL NO. 08612109
dc.identifier.urihttp://172.17.1.107:4000/handle/123456789/589
dc.language.isoenen_US
dc.relation.ispartofseriesTH-1395;
dc.subjectPHYSICSen_US
dc.titleGrowth and Study of Cubic Silicon Carbide (3C-Sic Thin Filma by Hot Wire Chemical Vapour Deposition Techniqueen_US
dc.typeThesisen_US
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