Kumar, T. Santhosh2015-09-222023-10-262015-09-222023-10-262014ROLL NO.09612111https://gyan.iitg.ac.in/handle/123456789/490Supervisor: D. PamuIn recent years, rapid growth of the wireless communication industry has led to a high demand for microwave ceramic components. Commercial wireless technologies such as cellular phones, direct broadcasting satellite (DBS) and global positioning systems (GPS) have been making quick progress due to the improved performance of devices like dielectric resonators (DR) at microwave frequencies. DRs are highly densified ceramic samples of regular geometry, which acts as a resonator at microwave frequencies. They are made of ceramic materials with high dielectric constant ( r), low value of tan (hence high-quality factor, Q) and low values of a temperature coefficient of resonant frequency ( f). The same materials are also being used for making substrates for microwave integrated circuits (MICs), ceramic filters and low temperature co-fired ceramic (LTCC) based highly miniaturized microwave systems. In a similar process, high dielectric constant thin films became important in microelectronics. This is mainly due to the fact that for charge storage, materials with higher dielectric constant are essential. As the device dimensions reduce smaller, the frequency of operation of the microelectronic devices goes up and energy dissipation per unit area increases. Hence, thin films with high dielectric constant and low dielectric loss even at higher frequencies and with low temperature dependence is important for such microelectronic applications. Furthermore, due to their good optical properties, dielectric thin films having applications in integrated optical devices with various functions such as optical switching, modulation and coupling in optical communication, optical coatings, and antireflection coatings, etc. Therefore, a suitable DR composition is identified for this study to make both bulk and thin film DRs and characterize the same in the microwave frequencies. This study would confirm the presence of excellent bulk characteristics in thin film as well.enPHYSICSThesis