Abstract:
Present work mainly focus on two lithographic techniques viz. selective laser ablation lithography and atom lithography using dipole force. The work on atom lithography using dipole is on simulation of atomic trajectories under dipoleforce using semi-classical technique for various configuration of atomic beams and light fields to focus down the atomic beam at sub-micron level. Through these studies new configuration of light fields and atomic beams were proposed for their applications in the field of microlithography and nanolithography. We proposed the use of square arrays of multiple atomic lens produced by interference of four nearly collinear optical beams in atom lithography using dipole force. This configuration is useful in writing large number of micro-periodic structure in square arrays in a single step via atom lithography. A novel configuration of microscopic square arrays...
